| Name of the Equipment | Spin Coater - Laurell (For Raith 150) |
| Category | litho/analytical |
| Operator | Hemant Kshirsagar
|
| System Owner | Hemant Kshirsagar
hemant@ee.iitb.ac.in
Anjum Khan
anjum04@iitb.ac.in
|
| Short Name | |
| Make/ Model | WS-650-23NPP |
| Critical Tool | No |
| Serial Number | |
| FootPrint | |
| InstallationDate | |
| Equipment Type | Lithography tools |
| Location | Nano Litho Lab |
| AMC | Required |
| Local Dealer |
SIMCO |
| Actual Dealer | Laurell
SIMCO, New Delhi |
| Training & other policy documents | |
| Recipe List | |
| Glimpse | |
| Tool Facilities Requirements | Blower, PN2 |
| Access | Open |
| Lab Phone No | |
| Substrate allowed | |
| Substrate Dimension | Min 1/4 of 2 inch wafer. 4 inch max |
| Chemical allowed | Photoresists, Acetone for cleaning, Photoresists |
Precursors/ Targets allowed
*Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | NA |
| Contamination remarks | NA |
