Sputter NMPF
| Name of the Equipment | Sputter NMPF |
| Category | gold contaminated |
| Operator | Minita Surwade Shahiroze Khetani Gopika Suresh |
| System Owner | Akula Rao 30007057@iitb.ac.in Akanksha Chouhan 174070019@iitb.ac.in |
| Short Name | |
| Make/ Model | |
| Critical Tool | No |
| Serial Number | |
| FootPrint | |
| InstallationDate | |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | Nano 2 Lab |
| AMC | Required |
| Local Dealer | |
| Actual Dealer | AJA topgun@ajaint.com |
| Training & other policy documents | |
| Recipe List | RECEPIES/330_RECEPIES.pdf |
| Glimpse | |
| Tool Facilities Requirements | |
| Access | Controlled |
| Lab Phone No | Deposition: PVD Sputter Tools |
| Substrate allowed | Si, Ge, GaN,GaAs,LSMO,PCMO,YIG,SRO, (No Glass) |
| Substrate Dimension | Max 4 inch. Sample height not more than 3 mm |
| Chemical allowed | , |
| Precursors/ Targets allowed *Based on stock availability | |
| Precursor/ Target loaded inside tool | 63 |
| Target dimension | 2 inch diameter |
| Gases allowed | O2, Ar, PN2 |
| Contamination remarks | Na, K containing samples not allowed |