| Name of the Equipment | Deep Reactive Ion Etching Samco |
| Category | gold contaminated |
| Operator | Hemant Kshirsagar
Pankajkumar Gound
|
| System Owner | Hemant Kshirsagar
hemant@ee.iitb.ac.in
Manish Khemnani
30006941@iitb.ac.in
|
| Short Name | |
| Make/ Model | SAMCO |
| Critical Tool | Yes |
| Serial Number | 400 iPB |
| FootPrint | |
| InstallationDate | 05/01/2017 |
| Equipment Type | Dry Etch tools |
| Location | Nano 2 Lab |
| AMC | Required |
| Local Dealer |
Simco Global Technology & Systems Ltd
14 Bhawani Kunj, Behind Sector-D, Pocket-II, Vasant Kunj, New Delhi - 110070 India
Tel.: +91-11-26894181, 26899867
(M): 9818203736
Fax: +91-11-26894101, +91-11-26124461
Email: simco.del@simcogroup.in
Website: www.simco-groups.com |
| Actual Dealer |
Hirokazu AMAMORI
Manager
South-East Asia & India Region
Samco Inc. International Sales Division:
Head Office: 36 Wararya-cho, Takeda, Fushimi-ku, Kyoto 612-8443 Japan
Tel: +81-75-621-7841 Mobile: +81-90-3064-6398
URL: https://www.samcointl.com/
Email: amamori-hiro@samco.co.jp |
| Training & other policy documents | |
| Recipe List | |
| Glimpse | |
| Tool Facilities Requirements | |
| Access | Controlled |
| Lab Phone No | Reactive Ion Etching |
| Substrate allowed | Si, diamond |
| Substrate Dimension | Maximum 4 inch wafer |
| Chemical allowed | , Photoresist, SiO2, SiN, EBL resist. |
Precursors/ Targets allowed
*Based on stock availability | |
| Precursor/ Target loaded inside tool | 63 |
| Target dimension | |
| Gases allowed | SF6, C4F8, O2, Ar, PN2, GN2 |
| Contamination remarks | Metals, if present on the sample, should not be exposed to plasma. Need to cover them with resist. |
