RIE-1C Plasma Etcher - Samco
| Name of the Equipment | RIE-1C Plasma Etcher - Samco |
| Category | gold contaminated |
| Operator | Hemant Kshirsagar Shilpa Kharat Minita Surwade |
| System Owner | Hemant Kshirsagar hemant@ee.iitb.ac.in Shilpa Kharat 30003402@iitb.ac.in |
| Short Name | |
| Make/ Model | SAMCO - RIE - 1C |
| Critical Tool | No |
| Serial Number | |
| FootPrint | |
| InstallationDate | |
| Equipment Type | Dry Etch tools |
| Location | Nanoelectronics Processing Lab (NanoE bldg, 1st floor) |
| AMC | Required |
| Local Dealer | SIMCO SIMCO |
| Actual Dealer | SAMCO Mr. Amamori, SAMCO |
| Training & other policy documents | POLICY/337_POLICY.pdf |
| Recipe List | RECEPIES/337_RECEPIES.pdf |
| Glimpse | GLIMPSE/337_GLIMPSE.pdf |
| Tool Facilities Requirements | |
| Access | Controlled |
| Lab Phone No | Plasma Asher and Etcher |
| Substrate allowed | |
| Substrate Dimension | |
| Chemical allowed | IPA for cleaning, Si, SiO2, Poly Si, a-Si, Si Nitride, Resists |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | 63 |
| Target dimension | NA |
| Gases allowed | PN2, GN2, CF4, O2 |
| Contamination remarks | Na, K not allowed |