Equipment Details


Rapid Thermal Processing Group IV (RTP Grp-IV)

Name of the EquipmentRapid Thermal Processing Group IV (RTP Grp-IV)
Categorysemi clean b
Operator
System OwnerNihal Raut
23d0514@iitb.ac.in

Short NameNA
Make/ ModelAnnealsys AS-one 100
Critical ToolYes
Serial Number
FootPrint550mm(W) x 800mm(D)
InstallationDate08/16/2022
Equipment TypeDeposition, Growth and Annealing systems
LocationNanoelectronics Processing Lab (NanoE bldg, 1st floor)
AMC Required
Local DealerEl Camino Technologies Pvt.

El Camino Technologies Pvt. Ltd. #8, 1st block, 1st main, BEL Layout, Vidyaranyapura, Bangalore - 560097, INDIA. Tel: 91 80 23640503 Contact Person: Amaresh.N.G, Maintenance Engineer, MOB NO - 09900836368 e-mail: maintenance@elcamino.in, Contact Person: 1) Chetna Mohan: chetnamohan@elcamino.in 2) Amaresh N G: maintenance@elcamino.in (+919900836368)
Actual DealerAnnealsys

Annealsys Bat T2, PIT de la Pompignane, Rue de la Vieille Poste, 34055 Montpellier Cedex 1, France Phone: +33 467 20 23 63 Email: info@annealsys.com Contact Person(s): 1) Frank Laporte: flaporte@annealsys.com, 2) 2) Albin Diranzo: adiranzo@annealsys.com
Training & other policy documentsPOLICY/355_POLICY.pdf
Recipe List
Glimpse
Tool Facilities RequirementsChiller water, PN2, GN2,Ar, O2, N2, FGA, N2O
AccessControlled
Lab Phone No
Substrate allowedOnly Si, Ge, and Diamond substrates are allowed.
Substrate Dimension0.5 by 0.5 mm to 4 inches wafer
Chemical allowedIPA for cleaning, SiO2, Gd2O3, ZrO2, HfO2, HZO, Al2O3
Precursors/ Targets allowed
*Based on stock availability
NA
Precursor/ Target loaded inside tool47,1
Target dimensionNA
Gases allowedAr, O2, N2, FGA, N2O
Contamination remarksSamples with metals are not allowed. Samples with photoresist are not allowed. Gold contaminated, Outside samples, NCPRE Samples, OE Lab, Na+ & K+ not allowed further information contact SO/Process Technologist
Last updated on: 24-Oct-2026