Plasma Asher New
| Name of the Equipment | Plasma Asher New |
| Category | clean |
| Operator | Shilpa Kharat Gopika Suresh Shahiroze Khetani |
| System Owner | Minita Surwade minita@iitb.ac.in |
| Short Name | |
| Make/ Model | |
| Critical Tool | No |
| Serial Number | |
| FootPrint | |
| InstallationDate | |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | Nano 2 Lab |
| AMC | Required |
| Local Dealer | |
| Actual Dealer | |
| Training & other policy documents | |
| Recipe List | RECEPIES/357_RECEPIES.pdf |
| Glimpse | GLIMPSE/357_GLIMPSE.pdf |
| Tool Facilities Requirements | |
| Access | Open |
| Lab Phone No | Plasma Asher and Etcher |
| Substrate allowed | Si, GaN, Diamond |
| Substrate Dimension | Max. 3 inch wafer |
| Chemical allowed | , |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | oxygen |
| Contamination remarks |