ICPRIE - Dia
| Name of the Equipment | ICPRIE - Dia |
| Category | semi clean a |
| Operator | Shilpa Kharat Manish Khemnani |
| System Owner | Anuj Bathla (H) 184366003@iitb.ac.in Shilpa Kharat 30003402@iitb.ac.in |
| Short Name | NA |
| Make/ Model | Sentech |
| Critical Tool | No |
| Serial Number | 500 501 |
| FootPrint | NA |
| InstallationDate | 17-05-2023 |
| Equipment Type | Dry Etch tools |
| Location | Nanoelectronics Processing Lab (NanoE bldg, 1st floor) |
| AMC | Required |
| Local Dealer | Sachin Shette Labindia Instruments Pvt Ltd 201, Nand Chambers, L.B.S. Marg, Near Vandana Cinema, Thane – 400 602 Maharashtra, INDIA Email : sachin.shette@labindia.com United Service Email : service@labindia.com www.labindiainstruments.com Sachin Shette Direct – 0252-2667070 / Cell – 9920650057 Regional Manager West – United Service |
| Actual Dealer | Labindia Instruments Pvt Ltd. Labindia Instruments Pvt Ltd. 372, Udyog Vihar, Phase-II Gurgaon, Haryana – 122016 Direct: +91 124-4793323 Office: +91 124 2843000/3300, 4793000/3300 Email : navin.kumar@labindia.com Support : service@labindia.com Web : www.labindiainstruments.com |
| Training & other policy documents | POLICY/360_POLICY.pdf |
| Recipe List | RECEPIES/360_RECEPIES.pdf |
| Glimpse | GLIMPSE/360_GLIMPSE.pdf |
| Tool Facilities Requirements | Chiller water, PN2, GN2 |
| Access | Controlled |
| Lab Phone No | Reactive Ion Etching |
| Substrate allowed | Si, SiN, SiO2, SiC and Diamond |
| Substrate Dimension | 0.5cm*0.5cm - upto 4 inch wafer |
| Chemical allowed | Propanol, Acetone, Only Photoresist is allowed as hard mask |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | CL2, BCL3,CHF3,O2,N2,CF4,Ar,SF6,He |
| Contamination remarks | Samples with Na and K not allowed |