Plasma Immersion Ion Implantation (PIII)
| Name of the Equipment | Plasma Immersion Ion Implantation (PIII) |
| Category | semi clean b |
| Operator | |
| System Owner | Minita Surwade minita@iitb.ac.in Karuna Nyaupane 30005949@iitb.ac.in |
| Short Name | |
| Make/ Model | Indigenious Assembled System/ NA |
| Critical Tool | No |
| Serial Number | NA |
| FootPrint | 9 x 9.5 feet |
| InstallationDate | 2009 |
| Equipment Type | Miscellaneous |
| Location | Micro2 Lab |
| AMC | Required |
| Local Dealer | Excel Instruments Excel Instruments, Andheri Subhash Pai Ph: 022 65008911 Jeetlal: 9004611185 |
| Actual Dealer | Indigenious Assembled System Subhash Pai Ph: 022 65008911 |
| Training & other policy documents | POLICY/73_POLICY.pdf |
| Recipe List | RECEPIES/73_RECEPIES.pdf |
| Glimpse | GLIMPSE/73_Glimpse.pdf |
| Tool Facilities Requirements | Chilled water, GN2, PN2, Diborane, Phosphine gases |
| Access | Open |
| Lab Phone No | Implant |
| Substrate allowed | Si, Ge |
| Substrate Dimension | Max 4 inch wafer |
| Chemical allowed | PPR, PMMA, SiO2, SiNx, a-Si, Si, SiGe, Ge, Ni, Co, Pt, Al, Hf, Ta, Mo, W, Ti, Cr, Zr, Pd |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | B2H6, PH3 |
| Contamination remarks | Samples from gold contaminated tools are not allowed |