2 inch Wet oxidation Furnace
| Name of the Equipment | 2 inch Wet oxidation Furnace |
| Category | clean |
| Operator | Shilpa Kharat |
| System Owner | Pankajkumar Gound p15129@iitb.ac.in |
| Short Name | |
| Make/ Model | NA/ NA |
| Critical Tool | Yes |
| Serial Number | NA |
| FootPrint | 3.75ft x 13 ft |
| InstallationDate | 05/09/2004 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | Micro1 Lab |
| AMC | Required |
| Local Dealer | assembled inhouse maintenance |
| Actual Dealer | NA NA |
| Training & other policy documents | POLICY/79_POLICY.pdf |
| Recipe List | RECEPIES/79_RECEPIES.pdf |
| Glimpse | GLIMPSE/79_Glimpse.pdf |
| Tool Facilities Requirements | N2, O2, H2, Exhaust |
| Access | Open |
| Lab Phone No | Annealing and Oxidation |
| Substrate allowed | Si Wafer with RCA cleaning or piranha cleaning |
| Substrate Dimension | Quarter of 2inch, 2inch |
| Chemical allowed | NA, only silicon wafers (others under contamination clearance) |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | N2, O2, H2 |
| Contamination remarks | clean |