Inductively coupled plasma CVD (ICPCVD)
| Name of the Equipment | Inductively coupled plasma CVD (ICPCVD) |
| Category | semi clean b |
| Operator | Minita Surwade |
| System Owner | Minita Surwade minita@iitb.ac.in Hemant Kshirsagar hemant@ee.iitb.ac.in |
| Short Name | |
| Make/ Model | Oxford Instruments/ Plasma lab system100 |
| Critical Tool | No |
| Serial Number | 94-814852 |
| FootPrint | Length 1.93 mtr, Breadth 2.28 mtr, Height1.57 |
| InstallationDate | 08/01/2008 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | Nano Lab |
| AMC | Required |
| Local Dealer | Gurpal Singh Gurpal.SINGH@oxinst.com |
| Actual Dealer | Oxford instruments thomas.miller@oxinst.com |
| Training & other policy documents | POLICY/8_POLICY.pdf |
| Recipe List | RECEPIES/8_RECEPIES.pdf |
| Glimpse | GLIMPSE/8_GLIMPSE.pdf |
| Tool Facilities Requirements | Nitrogen, Argon, Silane, CF4, N2O, Ammonia, Hydrogen, Water connection |
| Access | Open |
| Lab Phone No | Deposition: CVD Tools |
| Substrate allowed | Si/ Ge/ GaN/ Quartz/ GaA s |
| Substrate Dimension | Pieces to 4 inch wafer |
| Chemical allowed | IPA for cleaniing, Si, TiN, ZnO, GaN, GaAs, Al |
| Precursors/ Targets allowed *Based on stock availability | NA |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | GN2, PN2, Ar, N2O, SiH4, NH3, H2, He, CF4/ O2 for cleaning |
| Contamination remarks | Gold contaminated wafers not allowed.Outside samples, NCPRE Samples, OE Lab, Na+ & K+ not allowed further information contact SO/Process InCharge |