6 Target E Beam Evaporator
| Name of the Equipment | 6 Target E Beam Evaporator |
| Category | gold contaminated |
| Operator | |
| System Owner | |
| Short Name | |
| Make/ Model | Semicore/ NA |
| Critical Tool | No |
| Serial Number | NA |
| FootPrint | 2 x3 m |
| InstallationDate | 2013 |
| Equipment Type | Deposition, Growth and Annealing systems |
| Location | MBE Clean Room 2 (NanoE bldg, Gr floor) |
| AMC | Required |
| Local Dealer | OM Scientific OM Scientific |
| Actual Dealer | OM Scientific OM Scientific |
| Training & other policy documents | POLICY/99_POLICY.pdf |
| Recipe List | |
| Glimpse | GLIMPSE/99_GLIMPSE.pdf |
| Tool Facilities Requirements | N2, Chilled water |
| Access | Controlled |
| Lab Phone No | |
| Substrate allowed | Si, Ge, GaAs GaN, Glass, Quartz |
| Substrate Dimension | Pieces to 4 inch wafer |
| Chemical allowed | NA, Gold, Nickel, Gold-Germanium alloy, Titanium |
| Precursors/ Targets allowed *Based on stock availability | Au, Ni, Ti, Au-Ge alloy |
| Precursor/ Target loaded inside tool | |
| Target dimension | NA |
| Gases allowed | Nitrogen |
| Contamination remarks | Al coated, HfO2, Carbon, copper etc samples are not allowed |